Zhengzhou,Henan,China
About Aluminum Sputtering Target American Elements specializes in producing high purity Aluminum Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Appearance: SilverySputtering Aluminum Target Aluminum Vacuum Magnetic Control Sputtering High-purity Aluminum Target $700.00/ Piece 1 Piece (Min. Order) CN Huizhou Key Optoelectronic Material Co., Ltd. 2 YRS Contact Supplier Ad 1 / 2 Targets Factory Price Ti3AlC2 Sputter Targets $100.00-$500.00/ Piece 2.0 Pieces (Min. Order) CN Shanghai Epoch Material Co., Ltd.
High Purity Aluminum Disks Aluminum Sputtering Targets Laurand Associates specializes in Aluminum Sputtering Targets for PVD (physical vapor deposition) and CVD (chemical vapor deposition) for thin film, optic, and electronic applications. Because we focus on aluminum products, we are able to offer low cost products.
For customers seeking to lower their cost of ownership even further, Tosoh SMD offers our XTREME™ extended life Aluminum sputtering target. By working with leading OEM's and customers, Tosoh SMD designed this target to provide maximum system uptime through an extended target life with predictable and consistent performance.
Aluminum Nitride (AlN) Sputtering Targets Overview. ... Using other sputtering orientations or if there is a poor thermal interface between target to sputter cathode cooling well may require a reduction in suggested maximum power density and/or application of a thermal transfer paste.
Color/Appearance: Bluish White, Crystalline Solid